High Purity Aluminum Rotary Targets (Tubes)

High purity aluminum rotary targets (tubes) are cylindrical sputtering sources designed for large-area magnetron sputtering systems. The tubular geometry provides uniform erosion across the target surface, significantly higher material utilization, and extended operational life compared to planar targets, resulting in reduced downtime and lower cost of ownership in high-volume production environments. Available in purities from 4N (99.99%) to 5N (99.999%), these rotary targets deliver consistent, low-contamination performance for demanding thin film processes. Custom lengths, diameters, wall thicknesses, and backing tube bonding options are available to accommodate specific deposition equipment and process requirements. GDMS COA included with each shipment. Rotary targets are typically produced to order. Lead times vary depending on specifications and current workload. Please contact us for current availability and delivery estimates. Standard Size 4.8” (122 mm) ID / 6.7” (170 mm) OD, up to 112” (2,844 mm) length (unfinished ends) *It is possible to machine the standard size ID/OD - 122 mm/170 mm to narrower tube thickness at an additional charge. Typical Applications: • Semiconductor wafer processing • Flat panel display and touch screen coatings • Architectural glass and large-area optical coatings • Solar cell and photovoltaic manufacturing • Industrial-scale thin film production • Aerospace and automotive component coatings Related Articles All About Aluminum Sputtering Targets Thin Film Deposition Guide