Aluminum Starting Sources

High purity aluminum starting sources are pre-formed or alloyed evaporation materials optimized for thermal, electron-beam, and vacuum deposition processes. Their controlled geometry and chemistry promote rapid, stable melting with minimal spitting or fractionation, delivering consistent deposition rates and high-quality thin films with low contamination.Available in purities from 4N (99.99%) through 6N (99.9999%), including specialty alloy grades such as AlCu1%. Other alloys such as AlSi, AlCuSi, AlMg, AlMgSi, AlNi, and AlNd may be available. GDMS analysis and argon packaging are available for ultra-pure grades.Typical Applications: Semiconductor thin film metallization · Optical coatings and mirrors · Solar cell contacts · OLED/display manufacturing · Compound semiconductor and quantum device fabrication · Electron-beam & thermal evaporation systems · University and national laboratory R&D.