Aluminum Sputtering Targets - Disks

High purity aluminum disks and sputtering targets are precision-machined source materials optimized for physical vapor deposition (PVD) systems, including magnetron, RF, and DC sputtering. Manufactured from controlled-purity aluminum, these targets provide clean, dimensionally accurate sources that ensure high-quality thin films with low contamination and excellent process stability. Available in purities from 4N (99.99%) through 6N (99.9999%) depending on current inventory, HPA supplies standard disk sizes as well as custom-machined targets and bonded assemblies for specific deposition tools and chamber requirements. Specialty high purity aluminum alloy grades, including AlSi, AlCu, AlCuSi, AlMg, AlMgSi, AlNi, and AlNd, may also be available for applications requiring controlled chemistry. GDMS-certified lots available for critical applications. Feel free to send us your Target Design, and we can custom quote the machining including backing materials. Typical Applications: Semiconductor metallization and interconnect layers · Flat panel display and touch screen coatings · Optical coatings and precision mirrors · Hard disk drive media · Solar cell contacts · MEMS and sensor device fabrication · Decorative and functional PVD coatings.