Quartz Tube OD 20–45mm | Thick Wall High Purity Fused Silica Tube 99.95% Purity for Semiconductor Diffusion Furnace

Quartz Tube OD20–45mm | Heavy-Duty Large Bore Industrial Fused Silica Parameter Specification Outer Diameter 20mm - 45mm Wall Thickness 2.0mm - 5.0mm Thick Wall Dimensional Tolerance ±0.1mm - ±0.2mm Ovality ≤0.5% High Roundness Custom Length 200mm - 2000mm OEM Processing SiO₂ Purity 99.95% Standard / 99.999% Ultra-high Temperature Resistance 1100℃ Long-term / 1450℃ Short-term Core Performance: Ultra-low thermal expansion, rapid cooling anti-crack, heavy acid corrosion resistance, pollution-free for semiconductor production Application: Semiconductor diffusion furnace, high-power IR heating component, high-temperature chemical reactor, industrial heating chamber