CO2多相流乾法清洗機

CO2多相流乾法清洗機

SKU: SGS-SA300

This product is designed for cleaning Wafer, chips, Sensor, optical lenses, prisms, PCBA, FPC, and光纤. It can remove particles as small as 0.1um and has a cleaning yield of 99%.

  • The description claims a minimum particle removal size of 0.1um and a cleaning yield of 99%.

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