GEMStar XT Thermal Atomic Layer Deposition System (ALD) (Copy)
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The GEMStar XT-S/D Thermal Atomic Layer Deposition system processes substrates from 200mm to 300°C, offering adjustable temperatures and multiple valve ports for various applications.
- The system can operate at up to 300 °C (450 °C optional).
- It supports both single and dual 200 °C manifold zones.
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