FlexAL ALD System

FlexAL ALD System

Brand: Oxford Instruments Plasma
SKU: FlexAL

The FlexAL system offers remote and thermal atomic layer deposition in a single tool, supporting various materials and precursors, and enabling clusterable substrate transfer.

  • The system supports remote plasma and thermal ALD processes.
  • It allows handling up to 200mm wafers.
  • It provides free ongoing process support for the lifetime of the tool.
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  • Default Title — 0.00 USD — In stock

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